Fabrication of grating waveguide using photopolymerization

Two ternary materials systems, which comprise photoinitiator/two-photon initiators, oligomer and binder were prepared. Polymeric waveguide film was manufactured by spinning the materials on optical glass (refraction index=1.5), the two-photon initiated photopolymerization (TPIP) and single-photon holographic photopolymerization were carried out respectively in the polymer waveguide film. The preparation of these materials was explained and absorption spectra were tested. The experimental results including the micrographs and diffraction patterns verifying the formation of grating waveguide structures were given. The results show that grating waveguide microstructures can be holographically fabricated by single-photon photopolymerization with low-power (tens mW) continuous-wave (CW) laser at 532 nm successfully. Because the continuous-wave laser at 532 nm is handier than one at 514 nm.