کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1679610 | 1010325 | 2006 | 4 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Investigations on New Scanning Pattern for Stereolithography
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موضوعات مرتبط
مهندسی و علوم پایه
سایر رشته های مهندسی
مهندسی صنعتی و تولید
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: Investigations on New Scanning Pattern for Stereolithography Investigations on New Scanning Pattern for Stereolithography](/preview/png/1679610.png)
چکیده انگلیسی
The basic layer-based manufacturing mechanism of stereolithography is built upon a scanning pattern for the entire cross section for each layer. In this investigation, a new schema of scanning is proposed and its effects on dimensional accuracy and surface profile are benchmarked against an industry standard scanning pattern. Experimental results show that the new scanning pattern offers further improvements in terms of dimensional accuracy and geometrical profile as supported by a higher value of process capability index Cpk. The use of Finite Element method to simulate the new scanning pattern is also described in order to provide an analogous insight on process effects and residual stress distribution.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: CIRP Annals - Manufacturing Technology - Volume 55, Issue 1, 2006, Pages 217-220
Journal: CIRP Annals - Manufacturing Technology - Volume 55, Issue 1, 2006, Pages 217-220