کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1680028 | 1518697 | 2014 | 4 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Artificial sub-μm magnetic patterning by He+ ion bombardment through a mask fabricated by Ultraviolet NanoImprint Lithography (UV-NIL)
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
سطوح، پوششها و فیلمها
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: Artificial sub-μm magnetic patterning by He+ ion bombardment through a mask fabricated by Ultraviolet NanoImprint Lithography (UV-NIL) Artificial sub-μm magnetic patterning by He+ ion bombardment through a mask fabricated by Ultraviolet NanoImprint Lithography (UV-NIL)](/preview/png/1680028.png)
چکیده انگلیسی
Light-ion bombardment induced magnetic patterning (IBMP) is a smart method to tailor the unidirectional anisotropy in exchange-bias layer systems. If the bombardment area is limited by shadow masks, artificial magnetic patterns can be generated which are stable in remanence. A method is described where it is possible to fabricate submicron magnetic patterns over large sample areas: Ultraviolet NanoImprint Lithography (UV-NIL) in combination with IBMP. We show the fabrication of artificial magnetic patterns with dimensions between 400 and 1000 nm over cm2 areas.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms - Volume 322, 1 March 2014, Pages 59–62
Journal: Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms - Volume 322, 1 March 2014, Pages 59–62
نویسندگان
Christoph Schmidt, Marek Smolarczyk, Ludmilla Gomer, Hartmut Hillmer, Arno Ehresmann,