کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1680452 | 1518709 | 2013 | 6 صفحه PDF | دانلود رایگان |

• SnO thin films are deposited, on amorphous glass substrates, using RF-sputtering technique.
• We, first time, report the swift heavy ion irradiation experiments on the SnO thin films.
• Three different fluences i.e. 1 × 1011, 1 × 1012, and 5 × 1012 ion/cm2 are taken.
• XRD, Raman and AFM measurements were performed.
This paper gives detailed investigations on the deposition of SnO thin films, on glass substrates, using RF sputtering technique. To check the stability of SnO phase, under high energy ion irradiation, swift heavy ion (SHI) beam irradiation experiments are performed using 150 MeV Au beams. The effect of irradiation, with three irradiation fluences i.e. 1 × 1011, 1 × 1012, and 5 × 1012 ions/cm2, is investigated by X-ray diffraction (XRD), Raman spectroscopy, and Atomic force microscopy (AFM). The possible mechanism of the structural changes (tetragonal SnO (space group P4/nmm) to orthorhombic SnO (space group Cmc21)) and surface microstructure evolutions is briefly discussed in the light of ion’s energy and energy loss processes.
Journal: Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms - Volume 308, 1 August 2013, Pages 15–20