کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1681239 1518704 2013 5 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Quantitative damage depth profiles in arsenic implanted HgCdTe
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد سطوح، پوشش‌ها و فیلم‌ها
پیش نمایش صفحه اول مقاله
Quantitative damage depth profiles in arsenic implanted HgCdTe
چکیده انگلیسی

Rutherford backscattering experiments under channeling conditions (RBS-c) have been carried out on Hg0.77Cd0.23Te (MCT) layers implanted with arsenic. Accurate damage profiles have been extracted through a simple formalism for implanted and annealed layers. Quantitative damage profiles are correlated with structural defects observed by bright-field scanning transmission electron microscopy (BF-STEM) and chemical composition measured by secondary ion mass spectrometry (SIMS). Evolution of damage for increasing ion implantation fluence has been investigated by these three complementary techniques. Evidence is found of irradiation induced annealing during implantation. A fast damage recovery has been observed for post-implantation thermal anneals. In the case of an implanted layer annealed during 1 h, the damage profile, associated with arsenic concentration measurements, indicates the presence of complexes involving arsenic.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms - Volume 313, 15 October 2013, Pages 76–80
نویسندگان
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