Temperature dependence of damage formation in Ag ion irradiated 4H-SiC

Rutherford backscattering spectrometry (RBS) in channelling mode was used to study the defect formation in silver (Ag) ion irradiated silicon carbide (SiC). The 4H-SiC samples were irradiated with 360 keV Ag ions at different temperatures (15, 295, 375, 475, 625 and 875 K) over a wide range of fluences (1×10111×1011 to 2×1016cm-2, depending on the irradiation temperature). The results can be divided into two groups: (i) for irradiation temperatures between 15 and 475 K amorphisation of the implanted layers is reached for ion fluences between 7×10137×1013 and 3×1014cm-2. The over-all cross-section of defect production at very low ion fluences which comprises the formation of point defects and of amorphous clusters, is almost identical for all data sets measured in this temperature range. Differences in the damage evolution which occur at higher ion fluences, suggest that the relative contribution of amorphous clusters within single ion impacts in crystalline material decreases with rising temperature. (ii) For irradiations performed at 625 and 875 K no amorphisation is found for ion fluences as high as 2×1016cm-2. With increasing ion fluence the defect concentration exhibits a distinctive plateau due to the balance between formation and recombination of point defects before increasing up to a saturation level well below amorphisation. For this final stage our results indicate a mixture of point defect clusters and extended defects most probably dislocations. A comparison with data from the literature suggests that the damage evolution for implantation at 625 and 875 K is strongly influenced by the mobility of vacancies starting at around 600 K.