کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1681432 | 1010437 | 2010 | 4 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Nanopatterning of silica with mask-assisted ion implantation
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
سطوح، پوششها و فیلمها
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: Nanopatterning of silica with mask-assisted ion implantation Nanopatterning of silica with mask-assisted ion implantation](/preview/png/1681432.png)
چکیده انگلیسی
In the present paper we combined ion implantation and nanosphere lithography to regularly dope, by a mask-assisted process, a SiO2 substrate with rare earth ions (Er) by ion implantation and to fabricate by sputtering a plasmonic 2D periodic array of Au nanostructures on the silica surface spatially coupled to the implanted Er3+ ions. The aim of this work is to study how Er3+ emission at 1.5 μm can be affected by the interaction with a plasmonic nanostructure. In particular we have found a variation of the radiative lifetime of the Er3+ emission and a change from single exponential to bi-exponential of the luminescence intensity decay.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms - Volume 268, Issue 19, 1 October 2010, Pages 3211–3214
Journal: Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms - Volume 268, Issue 19, 1 October 2010, Pages 3211–3214
نویسندگان
G. Perotto, V. Bello, T. Cesca, G. Mattei, P. Mazzoldi, G. Pellegrini, C. Scian,