کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1681437 1010437 2010 4 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Irradiation effect of carbon negative-ion implantation on polytetrafluoroethylene for controlling cell-adhesion property
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد سطوح، پوشش‌ها و فیلم‌ها
پیش نمایش صفحه اول مقاله
Irradiation effect of carbon negative-ion implantation on polytetrafluoroethylene for controlling cell-adhesion property
چکیده انگلیسی

We have investigated the irradiation effect of negative-ion implantation on the changes of physical surface property of polytetrafluoroethylene (PTFE) for controlling the adhesion property of stem cells. Carbon negative ions were implanted into PTFE sheets at fluences of 1 × 1014–1 × 1016 ions/cm2 and energies of 5–20 keV. Wettability and atomic bonding state including the ion-induced functional groups on the modified surfaces were investigated by water contact angle measurement and XPS analysis, respectively. An initial value of water contact angles on PTFE decreased from 104° to 88° with an increase in ion influence to 1 × 1016 ions/cm2, corresponding to the peak shifting of XPS C1s spectra from 292.5 eV to 285 eV with long tail on the left peak-side. The change of peak position was due to decrease of C–F2 bonds and increase of C–C bonds with the formation of hydrophilic oxygen functional groups of OH and CO bonds after the ion implantation. After culturing rat mesenchymal stem cells (MSC) for 4 days, the cell-adhesion properties on the C−-patterned PTFE were observed by fluorescent microscopy with staining the cell nuclei and their actin filament (F-actin). The clear adhesion patterning of MSCs on the PTFE was obtained at energies of 5–10 keV and a fluence of 1 × 1015 ions/cm2. While the sparse patterns and the uncontrollable patterns were found at a low fluence of 3 × 1014 ions/cm2 and a high fluence of 3 × 1015 ions/cm2, respectively. As a result, we could improve the surface wettability of PTFE to control the cell-adhesion property by carbon negative-ion implantation.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms - Volume 268, Issue 19, 1 October 2010, Pages 3231–3234
نویسندگان
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