کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1682103 1518732 2012 7 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Damage buildup and annealing characteristics in Be-implanted InAs0.93Sb0.07 film
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد سطوح، پوشش‌ها و فیلم‌ها
پیش نمایش صفحه اول مقاله
Damage buildup and annealing characteristics in Be-implanted InAs0.93Sb0.07 film
چکیده انگلیسی
Damage buildup in 80 keV Be-implanted InAs0.93Sb0.07 epitaxial layer grown by liquid epitaxy growth (LPE) with the implantation fluences ranging from 1 × 1013 to 4 × 1015 cm−2 have been detailedly investigated by high resolution X-ray diffraction (HRXRD) and transmission electron microscopy (TEM). The implantation-induced nonlinear maximum perpendicular strain εm as a function of the Be fluence was deduced. Microstructural variation created by damage buildup was analyzed. The characteristics of annealing on the lattice damage were also studied. The created damages can be recovered by rapid thermal annealing at 500 °C for samples with the fluence below 1.0 × 1015 cm−2, but nano-sized residual damages still existed when the fluence reaches 4.0 × 1015 cm−2 due to the poor recrystallization of the small disorder region.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms - Volume 285, 15 August 2012, Pages 11-17
نویسندگان
, , , , , , , , , , ,