Characteristics of multi-element (ZrTaNbTiW)N films prepared by magnetron sputtering and plasma based ion implantation

• Multi-element films are prepared by combined magnetron sputtering and PBII.
• XPS confirms ZrN, TiN, TaN, Nb–N, ZrO2, Ta, Nb and W in the nitride film.
• Multi-element (ZrTaNbTiW)N films formed BCC and FCC phases.
• Maximum hardness and elastic modulus of nitride films reached 13.5 and 178.9 GPa.

Multi-element (ZrTaNbTiW)N films are prepared by multi-target magnetron sputtering deposition and nitrogen plasma based ion implantation (PBII). The composition, structure and mechanical properties of the films are investigated. X-ray photoelectron spectroscopy (XPS) confirms the formation of a mixture of ZrN, TiN, TaN, Nb–N, ZrO2, Ta, Nb and W in the nitride film. X-ray diffraction (XRD) shows that the (ZrTaNbTiW) alloy film exhibits an amorphous phase, while the (ZrTaNbTiW)N nitride films are composed of BCC and FCC structures. The hardness and modulus of the films are improved significantly after nitrogen PBII and reach maximum values of 13.5 and 178.9 GPa, respectively.