Study on cationic photopolymerization reaction of epoxy polysiloxane

The effects of epoxy monomers, concentration of photoinitiator and radical photoinitiators on the photosensitive properties of cationic phopolymerization system with a novel epoxy polysiloxane oligomer (CEPS) were investigated via a gel yield method. The results showed that among the tested epoxy monomers, the reactivity of ERL-4221 with cycloaliphatic epoxy groups was the highest. The optimum concentration of diaryldiodonium salt (SR-1012) was determined as 4–5 wt.%. Increasing the amounts of ERL-4221 in the CEPS cationic photopolymerization system, UV-curing rate increased. Radical photoinitiators with ArCO structure possessed sensitization capacity to the cationic photoinitiator SR-1012. The photosensitivity of the CEPS system could be up to 165 mJ/cm2. Adding a small amount of IPA and BP could greatly improve the photosensitivity of CEPS cationic photosensitive system. The optimal quantity of isopropanol added to the system was not more than 2 wt.%.