کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1683721 1010512 2007 4 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
New formula for description of positron implantation profile in condensed matter
کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد سطوح، پوشش‌ها و فیلم‌ها
پیش نمایش صفحه اول مقاله
New formula for description of positron implantation profile in condensed matter
چکیده انگلیسی
Traditionally, it is considered that implantation profile of positrons emitted form the radioactive source is expressed by the exponential function. The Monte Carlo simulations supported by experiments indicate that the profile exhibits more complex shape. In the presented paper we proposed the new, simple mathematical formula which allows describing the profile with a good accuracy. Only two phenomenological parameters and the energy spectrum of the implanted positrons are needed for the description of the profile. Their values were found for dozen of materials for the positron emitted from the 22Na and 68Geâ§¹68Ga sources.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms - Volume 258, Issue 2, May 2007, Pages 493-496
نویسندگان
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