Regular surface patterns by local swelling induced by He implantation into silicon through nanosphere lithography masks

Nanopatterning of silicon surfaces by means of He+ ion implantation through self-organized colloidal masks is reported for the first time. Nanosphere lithography (NSL) masks with mask openings of 46–230 nm width were deposited on Si(1 0 0) wafers. He+ ions were implanted through these masks in order to induce a local cavity formation and Si surface swelling. The surface morphology and the subsurface structure were studied using atomic force microscopy (AFM) and cross-sectional transmission electron microscopy (XTEM), respectively, as a function of mask and implantation parameters. It is demonstrated that regular arrays of both individual hillocks and trough-like circular rings can be generated.