کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1684091 | 1010521 | 2006 | 4 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Transport of multiply and highly charged ions through nanoscale apertures in silicon nitride membranes
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
سطوح، پوششها و فیلمها
پیش نمایش صفحه اول مقاله
چکیده انگلیسی
We report on experimental studies of the transport of multiply (Ar2,3+, 0.2–0.3 keV/u) and highly charged ions (Ar16+, Xe44+, 2–3 keV/u) through nanoscale apertures. Arrays of apertures with diameters of 50–200 nm and aspect ratios of 1.5:1–1:5 were formed in silicon nitride membranes by focused ion beam drilling in combination with ion beam assisted thin film deposition. The fraction of ions undergoing charge exchange is found to be in agreement with model predictions for low charge state ions, while it is much lower than expected for high charge state ions. We discuss results in relation to a classical over-the-barrier model and capillary guiding mechanisms.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms - Volume 244, Issue 2, March 2006, Pages 323–326
Journal: Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms - Volume 244, Issue 2, March 2006, Pages 323–326
نویسندگان
F.I. Allen, A. Persaud, S.J. Park, A. Minor, M. Sakurai, D.H. Schneider, T. Schenkel,