کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1684097 | 1010521 | 2006 | 5 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Damage induced by high energy multiply charged oxygen ions in oxide coated silicon
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
سطوح، پوششها و فیلمها
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چکیده انگلیسی
P-type oxide coated silicon samples of resistivity 120 Ω cm were irradiated with 60 MeV oxygen ions of fixed charge states 4+, 5+, 6+ and 7+ at an equal fluence of, Ï, â¼1013 ions/cm2. The induced damage was estimated by Hall voltage, Hall coefficient, carrier concentration and lifetime of minority carriers. The results indicate that Hall voltage (VH) and Hall coefficient (RH) increases, while carrier concentration (n) decreases with the charge state of impinging oxygen ions. The VH increases from 22 mV to 76.5 mV at typical current of 0.5 mA, RH from 0.42 Ã 105 cm3/C to 2.16 Ã 105 cm3/C and n decreases from 9 Ã 1013 cmâ3 to 2.88 Ã 1013 cmâ3 for the different charge states. This fact is an evidence that the oxygen ions with an individual fixed charge state passing through very thin 40 Ã
layer of silicon dioxide, induces significant damage at the SiO2-Si interface through the mechanism of electronic stopping power. The lifetime of minority charge carriers, Ï (bulk property), remains constant at around 6 μs for all the charge states of the 60 MeV energy oxygen ion irradiated samples at a constant fluence of, Ï, 1013 ions/cm2.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms - Volume 244, Issue 2, March 2006, Pages 354-358
Journal: Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms - Volume 244, Issue 2, March 2006, Pages 354-358
نویسندگان
S.D. Dhole, S.S. Dahiwale, V.R. Kulkarni, K.A. Bogle, N.S. Shinde, V.N. Bhoraskar,