کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1684901 | 1010540 | 2009 | 4 صفحه PDF | دانلود رایگان |
![عکس صفحه اول مقاله: Sputtering induced by cluster impact on metal targets: Influenceof electronic stopping Sputtering induced by cluster impact on metal targets: Influenceof electronic stopping](/preview/png/1684901.png)
The effect of electronic stopping on the sputtering of metals by cluster impact is discussed. We focus on the specific case of Au13 impact on a Au surface. Using molecular-dynamics simulation, we study several strategies to include electronic stopping. Electronic stopping influences both the magnitude of the sputter yield and the duration of the sputter process. In the usual procedure, electronic stopping only affects sufficiently fast atoms with kinetic energies above a threshold energy, which is of the order of the target cohesive energy. When assuming that electronic stopping holds down to thermal energies <1 eV, or even to 0 eV, the collision spike is rapidly quenched and the sputter yields become unrealistically small. Furthermore, we implement a scheme to include electronic stopping based on local (electron) density information readily available in a simulation.
Journal: Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms - Volume 267, Issue 16, 15 August 2009, Pages 2765–2768