کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1685231 1518733 2012 4 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
X-ray analyses of thermally grown and reactively sputtered tantalum oxide films on NiTi alloy
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد سطوح، پوشش‌ها و فیلم‌ها
پیش نمایش صفحه اول مقاله
X-ray analyses of thermally grown and reactively sputtered tantalum oxide films on NiTi alloy
چکیده انگلیسی

Sputter deposition of tantalum (Ta) on the surface of NiTi alloy is expected to improve the alloy’s corrosion resistance and biocompatibility. Tantalum is a well-known biomaterial which is not affected by body fluids and is not irritating to human tissue. Here we compare the oxidation chemistry crystal structure evolution of tantalum oxide films grown on NiTi by reactive O2 sputtering and by thermal oxidation of sputter deposited Ta films. The effect of sputtering parameters and post-sputtering treatments on the morphology, oxidation state and crystal structure of the tantalum oxide layer have been investigated by field-emission scanning electron microscopy (FE-SEM), X-ray photoelectron spectroscopy (XPS) and X-ray diffraction (XRD). The study has found that it may be better to avoid oxidation at and above 600 °C. The study establishes that reactive sputtering in presence of low oxygen mixture yields thicker film with better control of the film quality except that the surface oxidation state of Ta is slightly lower.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms - Volume 284, 1 August 2012, Pages 49–52
نویسندگان
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