A low-cost, accurate and non-intercepting continuous method for beam current measurements in a high-current ion implanter

The development of a low-cost, accurate, non-intercepting continuous method for measuring the beam current in a high-current ion implanter is described. The method, named a differential current monitor, is based on the electric charge conservation principle, applied to the currents that flow in the implanter electrical system, due to the acceleration voltage applied to the ion beam and the leakage currents to ground. This method allows for continuous measurement of the ion beam current without intercepting it. Since its installation, it is possible to accurate measure ion beam currents from tens of μA to mA, which is the normal range for this type of system.