Macroscopic parameters of the interaction of an Ar+ ion beam with a Si pitch grating

A Si pitch grating has been exposed to a 6 keV Ar+ ion beam at normal angle of incidence as well as at angles of 35° both parallel and perpendicular to the structure. Sputtering of the grating has been observed experimentally by Rutherford back-scattering; the bombardment has been simulated by the SDTrimSP-2D code. The numerical simulations show reasonable agreement with experimental results. A pronounced anisotropy effect has been observed comparing the sputtering of the grating parallel and perpendicular to the structure.