کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1686459 1518763 2006 4 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
A nuclear reaction analysis and optical microscopy study on controlled growth of large SiC nanocrystals on Si formed by low-energy ion implantation and electron beam annealing
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد سطوح، پوشش‌ها و فیلم‌ها
پیش نمایش صفحه اول مقاله
A nuclear reaction analysis and optical microscopy study on controlled growth of large SiC nanocrystals on Si formed by low-energy ion implantation and electron beam annealing
چکیده انگلیسی

Ion implantation of 20 keV 12C+ ions into (1 0 0), p-type silicon with ion fluence of 8 × 1016 at. cm−2 followed by an electron beam annealing under high vacuum conditions has been performed to investigate the formation of crystalline nano-scale SiC features on the silicon surface. Depending on the implantation and annealing conditions, the SiC nanocrystal numbers and average spacing can be controlled by adjusting the implantation and annealing conditions. Typically 300–1000 SiC nanocrystals are produced per 1000 μm2 spaced 0.7–1.2 ± 0.1 μm. Nuclear reaction analysis measurements using the deuterium induced 12C(d, p)13C reaction show that carbon is present in the implanted and annealed samples and varies only to a small degree by the annealing time. However, by not using a liquid nitrogen trap surrounding the targets during implantation, the carbon contamination on the surface reduces the number of SiC nanocrystals and increases their average distance. Specific results are discussed.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms - Volume 249, Issues 1–2, August 2006, Pages 105–108
نویسندگان
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