کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1687678 1010677 2007 4 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Fabrication of hollow nanoclusters by ion implantation
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد سطوح، پوشش‌ها و فیلم‌ها
پیش نمایش صفحه اول مقاله
Fabrication of hollow nanoclusters by ion implantation
چکیده انگلیسی

Ag ions with four kinds of energies were implanted into silica to doses of 5 × 1016 and 1 × 1017 ions/cm2, respectively. Hollow Ag nanoclusters were observed in the 1 × 1017 Ag+ ions/cm2 implanted samples with energies of 150 and 200 keV. The evolution of hollow nanoclusters during annealing was carried out by in situ transmission electron microscopy observation. The energy dependence for the formation of hollow nanoclusters is studied. A potential mechanism for the formation of irradiation-induced nanovoids in nanoclusters is discussed.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms - Volume 262, Issue 2, September 2007, Pages 201–204
نویسندگان
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