Fabrication of magnesium silicide thin films by pulsed ion beam ablation in a 1.6Â kJ plasma focus device

► Deposition of magnesium silicide films on silicon (100) substrates. ► Using plasma focus device for the specific film deposition. ► Interactions between high energy magnesium ions and silicon (100) substrates. ► Analysis of structural properties of deposited films using XRD spectra. ► Analysis of surface morphology of deposited films using SEM and AFM images.