Effect of electrode architecture and process parameters on distribution of SiH3 in a PECVD system

► Porous electrode with gas inlet at the bottom of chamber can improve SiH3 distribution. ► SiH3 mole fraction increases as electrode separation decreases and 10 mm is the optimal distance. ► 2.5 mm of the hole diameter on porous electrode is the best. ► The gas flow rate of 0.5 m/s is selected as the optimal process conditions.