A new method for deposition of nano sized titanium nitride on steels

Active screen plasma nitriding is a new and common method for deposition of Iron nitride. Since techniques such as Chemical Vapor Deposition (CVD), Physical Vapor Deposition (PVD) and Plasma Assisted Chemical Vapor Deposition (PACVD) are usually applied in order to deposit the titanium nitride and each of these methods has its own problems, in this research active screen plasma nitriding method was introduced as a novel approach for deposition of nano sized titanium nitride. H11 tool steel samples were coated by plasma nitriding method at 550 °C for 5, 7.5 and 10 h, using three gas mixtures consisted of H2/N2 = 3, 1 and 1/3. Scanning Electron Microscopy (SEM) and X-ray Diffraction (XRD) and X-ray Photoelectron Spectroscopy (XPS) were employed to investigate the coating properties such as grain size, layer thickness and chemical composition. Results showed that the proportion of H2 in the gas mixture was a crucial point in order to obtain a perfect coating. By increasing the coating time, the grain size and the layer thickness increased. XPS results showed that the coating was mainly consisted of TiN + TiN0.1 together with a small amount of TiO4.

► Active screen plasma nitriding method was used to deposit nano TiN coating.
► The ratio of H2/N2 is important in order to obtain a good quality coating.
► By increasing the coating time, the grain size and the layer thickness increased.
► The coating was mainly consisted of TiN + TiN0.1 together with a small amount of TiO4.