کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1688958 1011203 2010 9 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Microstructural, mechanical and electrochemical corrosion properties of sputtered titanium–aluminum–nitride films for bio-implants
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد سطوح، پوشش‌ها و فیلم‌ها
پیش نمایش صفحه اول مقاله
Microstructural, mechanical and electrochemical corrosion properties of sputtered titanium–aluminum–nitride films for bio-implants
چکیده انگلیسی

The effect of aluminum (Al) addition to titanium nitride (TiN) matrix on the structural, mechanical and corrosion resistance properties of titanium–aluminum–nitride was studied. Ti1−xAlxN where x = 0, 0.5 and 1 films were coated onto substrates like Si wafer, AISI 316L stainless steel and low carbon steel by a direct current magnetron sputtering process. The layers were sputtered in pure Argon with a substrate temperature maintained at 400 °C, power of 250 W and a sputtering time of 120 min. XRD, TEM–SAED pattern and XPS analyses were made to study the structural properties of these films. Laser Raman spectrum showed the characteristic peaks at 249 and 659 cm−1 for the Ti0.5Al0.5N film. AFM analysis showed a relatively smooth surface for the ternary film. Corrosion performance analysis indicated that the Ti0.5Al0.5N coated specimen had superior corrosion resistance when compared to TiN and AlN coated substrates. Higher values of nanohardness and lower coefficient of friction were observed for the Ti 0.5Al0.5N specimen. Blood platelet adhesion experiments were made to examine the interaction between human blood and the materials in vitro.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Vacuum - Volume 85, Issue 5, 9 November 2010, Pages 601–609
نویسندگان
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