کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1689182 | 1011219 | 2010 | 4 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
High rate reactive deposition of TiO2 films using two sputtering sources
دانلود مقاله + سفارش ترجمه
دانلود مقاله ISI انگلیسی
رایگان برای ایرانیان
کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
سطوح، پوششها و فیلمها
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: High rate reactive deposition of TiO2 films using two sputtering sources High rate reactive deposition of TiO2 films using two sputtering sources](/preview/png/1689182.png)
چکیده انگلیسی
We propose a new high-rate reactive sputter-deposition method with two sputtering sources for fabricating TiO2 films. One source operates in a metal mode sputtering condition and supplies titanium atoms to the substrate. The other source operates in oxide mode and works as an oxygen radical source for supplying oxygen radicals to the substrate surface for promoting oxidization of titanium atoms. Each sputtering source is separated with a mesh grid from the deposition chamber, and Ar and oxygen gas are introduced separately through the titanium supply and oxygen radical sources, respectively. By using this reactive sputtering system, a deposition rate above 80 nm/min can be obtained for the deposition of TiO2 films with rutile structure.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Vacuum - Volume 84, Issue 12, 25 June 2010, Pages 1377–1380
Journal: Vacuum - Volume 84, Issue 12, 25 June 2010, Pages 1377–1380
نویسندگان
Yoichi Hoshi, Daiki Ishihara, Tetsuya Sakai, Osamu Kamiya, Hao Lei,