Photoresponse of hydrogen plasma treated and electron irradiated silicon wafers

The experiments have shown that the hydrogenation of the p-type wafers leads to the appearance of PV signal similar to that for silicon photodiodes as a result of the n-type layer creation near the hydrogenated surface. A drawing field created in the p-type wafers in consequence of their hydrogenation decreases the effect of the carrier diffusion length reduction due to electron irradiation that makes the hydrogenated p-type wafers less sensitive to the radiation impact.