کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1689618 | 1011235 | 2007 | 6 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Field emission characteristics of CuO nanowires by hydrogen plasma treatment
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
سطوح، پوششها و فیلمها
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چکیده انگلیسی
CuO nanowires were formed on copper-coated silicon substrates by a wet chemical process, immersing them in a hot alkaline solution. The effect of hydrogen plasma treatment on the field emission characteristics of the CuO nanowires was investigated. The results showed that hydrogen plasma treatment enhanced the field emission characteristics of the CuO nanowires showing a decrease in turn-on voltage as well as an increase of field enhancement factor. It is believed that hydrogen plasma treatment plays an important role in the improvement of field emission characteristics of CuO emitters.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Vacuum - Volume 81, Issue 7, 28 February 2007, Pages 851–856
Journal: Vacuum - Volume 81, Issue 7, 28 February 2007, Pages 851–856
نویسندگان
Woo-Yong Sung, Wal-Jun Kim, Seung-Min Lee, Ho-Young Lee, Yong-Hyup Kim, Kyung-Ho Park, Soonil Lee,