Characterization and properties of CrN films deposited by ion-source-enhanced middle frequency magnetron sputtering

CrN films with deposition rates of 130–180 nm/min were deposited on Si (111) and carbamide alloy substrates by an ion-source-enhanced middle frequency magnetron sputtering system. Increasing of ion source voltages promoted the growth of CrN films with preferred orientation of (200). The deposited CrN films are composed of nanocrystalline particles with sizes of ∼20 nm embedded in polycrystalline matrix. The hardness of the CrN films increases from 1300 Kg/mm2 without ion source bombardment to 2400 Kg/mm2 with ion source voltages of 1000 V. Origins for the increasing of hardness can be attributed to dislocation strengthening and densification effects.