کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1689793 | 1011240 | 2007 | 8 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Computer simulation of the formation of niobium film nanostructure by low-temperature deposition
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
سطوح، پوششها و فیلمها
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چکیده انگلیسی
Computer simulation is explored to study the formation of the niobium film nanostructure by low-temperature deposition. The dependence of dynamical evolution of surface morphology with respect to film thickness is investigated. Calculations of the film density variation at 300 and 800Â K are performed. It has been established that the formation of the microcracks elongated along the crystallographic ã1Â 0Â 0ã direction was the result of surface instabilities during film growth. The internal microstresses arising in the films were evaluated. It has become apparent that the whole complex of phenomena: the porosity formations, the block structure development, the internal microstresses, taking place in the low-temperature deposition, are involved in surface instabilities during niobium film growth.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Vacuum - Volume 81, Issue 5, 5 January 2007, Pages 700-707
Journal: Vacuum - Volume 81, Issue 5, 5 January 2007, Pages 700-707
نویسندگان
Ivan G. Marchenko,