کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1689828 | 1011242 | 2009 | 5 صفحه PDF | دانلود رایگان |
![عکس صفحه اول مقاله: Oxygen atom density in capacitively coupled RF oxygen plasma Oxygen atom density in capacitively coupled RF oxygen plasma](/preview/png/1689828.png)
The density of neutral oxygen atoms was determined in a plasma reactor for surface functionalization of polymer materials. Plasma was created in a stainless steel chamber by capacitively coupled RF generator at 13.56 MHz and adjustable forward power up to 100 W. Measurements were performed with a classical nickel catalytic probe. Systematic measurements were performed at a constant pumping speed, different flow rates from 15 to 100 sccm corresponding to pressures between 30 and 110 Pa, different powers between 40 and 100 W and different probe positions in the discharge chamber. The results showed that the O atom density did not depend much on probe position as long as it was between the powered electrode and grounded housing facing the electrode. The O density depended rather linearly with power at fixed pressure. At low power, the O density did not depend much on pressure, but at high power, it was increasing with increasing pressure. The O density was of the order of 1019 m−3 and increased slightly over 1020 m−3 at the highest power and pressure. The results were explained by gas phase and surface reactions.
Journal: Vacuum - Volume 83, Issue 5, 1 January 2009, Pages 792–796