Ti3SiC2-formation during Ti–C–Si multilayer deposition by magnetron sputtering at 650 °C

Titanium Silicon Carbide films were deposited from three separate magnetrons with elemental targets onto Si wafer substrates. The substrate was moved in a circular motion such that the substrate faces each magnetron in turn and only one atomic species (Ti, Si or C) is deposited at a time. This allows layer-by-layer film deposition. Material average composition was determined to Ti0.47Si0.14C0.39 by energy-dispersive X-ray spectroscopy. High-resolution transmission electron microscopy and Raman spectroscopy were used to gain insights into thin film atomic structure arrangements. Using this new deposition technique formation of Ti3SiC2 MAX phase was obtained at a deposition temperature of 650 °C, while at lower temperatures only silicides and carbides are formed. Significant sharpening of Raman E2g and Ag peaks associated with Ti3SiC2 formation was observed.

► Layer-by-layer magnetron deposition of Ti3SiC2 composition was performed.
► At substrate temperature of 650 °C Ti3SiC2 MAX phase was formed.
► At temperatures below 650 °C formation of Ti5Si3(Cx) and TiCy was observed.
► Raman spectra allow MAX phase identification by sharp E2g and Ag peaks.