Chromium and nickel substituted iron oxide thin films by DC sputtering

Chromium and nickel substituted iron oxide thin films have been deposited by DC sputtering. Films were coated in the thickness range of 130–400 nm, on boro silicate glass and quartz substrates. The films showed transmission as high as 90% in the visible region. The refractive index of the films was 1.6–2.1. The microwave dielectric constant varied as a function of composition from 24 to 12 at frequencies of 8.98 and 11.88 GHz. All the films were X-ray amorphous independent of deposition and post deposition annealing conditions. Surface morphology indicates that roughness is a function of both sputtering pressure as well as inter-electrode distance.