Deposition and characterization of MAX-phase containing Ti-Si-C thin films by sputtering using elemental targets

► Obtained Ti-Si-C films were composite materials consisting of Ti3SiC2 MAX-phase, TiCx phase and graphite phase. ► Physical and mechanical properties of the film depended on each amount of these phase. ► Each amount of these 3 phases depended on the carbon content in the film. ► The film properties could be controlled by the carbon content supplied using sputter-deposition.