کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1690446 1011260 2007 4 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Effect of argon and substrate bias on diamond thin film surface morphology
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد سطوح، پوشش‌ها و فیلم‌ها
پیش نمایش صفحه اول مقاله
Effect of argon and substrate bias on diamond thin film surface morphology
چکیده انگلیسی

Nanocrystalline materials are of high interest, because mechanical and physical properties of such materials are different from those or coarse-grained type. Continuous and smooth nanocrystalline diamond (NCD) thin films were successfully grown on mirror polished silicon substrates, using double bias plasma-enhanced hot filament chemical vapour deposition technique. A gas mixture of Ar:CH4:H2 and CH4:H2 was used as the precursor gas. The effect of the gas composition, flow rate and substrate bias during deposition on diamond crystallite size was investigated. Changing the growth parameters facilitates control of grain size of polycrystalline diamond thin films from microcrystalline to nanocrystalline. The structure of fine-grained NCD films has been studied with scanning electron microscopy and Raman spectroscopy.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Vacuum - Volume 82, Issue 2, 29 October 2007, Pages 154–157
نویسندگان
, , , , , ,