Influence of dual-frequency source powers on ion density and electron temperature in capacitively-coupled argon plasma

A complete floating double probe technique is used to measure the ion density and electron temperature in a dual frequency capacitively coupled plasma for argon discharges. It has been shown that there is an obvious modulating effect of the high- and low-frequency powers on the plasma parameters and their spatial distributions. In addition, the influence of the discharge gap on the ion density and electron temperature is also investigated by varying the LF power and fixed the HF power.

► A complete floating double probe technique is used in a dual frequency capacitively coupled plasma.
► We find that there is an obvious modulating effect of the high- and low-frequency powers on the plasma parameters and their spatial distributions.
► The influence of the discharge gap to coupling effect of the high- and low-frequency sources is researched.