Magnetron sputtering of a vanadium-diboride target in Ar+N2 gaseous mixtures

The structure and composition of nanostructured multilayer V-B-N films, deposited by high-frequency magnetron sputtering of a composite VB2 target in a gaseous mixture of argon and nitrogen, were studied by means of electron spectroscopy, X-ray diffraction and secondary ion mass-spectroscopy. The influence of the percentage ratio of nitrogen on the process of formation of films was investigated. On high-frequency reactive magnetron sputtering the composition of a superficial layer of a target changes. The influence of this change on structure and composition of coverings was described. The method of synthesis of multilayer films of borides and nitrides of vanadium is offered. Formation mechanisms of boride and nitride films are discussed.