Growth and properties of ZnS thin films by sulfidation of sputter deposited Zn

ZnS thin films with the hexagonal structure have been produced by sulfurizing sputter deposited Zn in sulfur vapor for 1 h. These films have been analyzed by X-ray diffraction (XRD), scanning electron microscopy (SEM), synchrotron radiation photoelectron spectroscopy (SR-PES), Auger electron spectroscopy (AES) and UV–VIS transmission spectra. It is found that at the sulfidation temperature (TS) of 400 °C a little and partial Zn can be transformed to ZnS. At TS = 500 °C, the total conversion of Zn in sulfur vapor can take place and form ZnS with a c-axis preferred orientation. The Zn-to-ZnS conversion is kinetically a reactive diffusion process. Also the ZnS thin film has much greater size of grains than the as-deposited Zn film, due to ZnS recrystallization and growth in sulfur vapor. Residual sulfur existing on the surface of ZnS grains leads to the poor optical transparency and great broadening of absorbing edge in the optical transmittance. However, ZnS thin film prepared by gradient sulfidation exhibits the improved optical transmittance, with a band-gap energy of 3.64 eV.

► ZnS thin films are produced by sulfurizing sputter deposited Zn in sulfur vapor.
► At 500 °C the total conversion of Zn to hexagonal ZnS can take place.
► The ZnS has much greater size of grains than the as-deposited Zn.
► Residual sulfur on the ZnS grain surface leads to the poor optical transparency.
► ZnS prepared by gradient sulfidation exhibits the improved optical transmittance.