کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1690687 | 1011271 | 2006 | 10 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Plasma polymer films from sputtered polyimide
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موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
سطوح، پوششها و فیلمها
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چکیده انگلیسی
Deposition of plasma polymer films by r.f. magnetron sputtering of polyimide in an atmosphere of argon, nitrogen and in a self-sputtering mode is studied. In situ analytical techniques are applied to monitor the composition of both plasma and growing film during the deposition. A co-evaporation regime is observed at higher applied powers. Such a regime is characterized by a significant increase in deposition rate of plasma polymer films. In addition CO-based groups appear in the plasma volume and in the resulting films. The films deposited in a pulsed mode are similar in composition to those deposited in the continuous regime at equivalent power. The plasma polymer films are found to be stable to short-term oxidation in air.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Vacuum - Volume 81, Issue 4, 6 November 2006, Pages 517–526
Journal: Vacuum - Volume 81, Issue 4, 6 November 2006, Pages 517–526
نویسندگان
A. Choukourov, J. Hanuš, J. Kousal, A. Grinevich, Y. Pihosh, D. Slavínská, H. Biederman,