کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1691016 | 1011291 | 2009 | 4 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Irradiation effects on solid surfaces by water cluster ion beams
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
سطوح، پوششها و فیلمها
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چکیده انگلیسی
The interaction between a water cluster ion beam and the surface of a silicon substrate was investigated. The sputtering yield of silicon by a water cluster ion beam was approximately ten times larger than that by an argon monomer ion beam. X-ray photoelectron spectroscopy was used to analyze the silicon surface irradiated with a water cluster ion beam. The analysis revealed that the surface was oxidized, and the oxidation was saturated approximately at the dose of 1Â ÃÂ 1014 ions/cm2. The number of disordered atoms measured by the Rutherford backscattering also supported the result.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Vacuum - Volume 84, Issue 5, 10 December 2009, Pages 501-504
Journal: Vacuum - Volume 84, Issue 5, 10 December 2009, Pages 501-504
نویسندگان
Hiromichi Ryuto, Keiji Tada, Gikan H. Takaoka,