کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1691079 1011294 2009 5 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Photocatalytic activity of TiO2 thin films deposited by RF magnetron sputtering
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد سطوح، پوشش‌ها و فیلم‌ها
پیش نمایش صفحه اول مقاله
Photocatalytic activity of TiO2 thin films deposited by RF magnetron sputtering
چکیده انگلیسی

Nano-TiO2 thin films were deposited on silicon and glass substrates by radio-frequency (RF) magnetron sputtering using TiO2 ceramic target and characterized by X-ray diffractometer, X-ray photoelectron spectrometer, atomic force microscope, and ultraviolet–visible spectrophotometer. Photocatalytic activity was evaluated by light induced degradation of 5 ppm methyl orange solution using a high pressure mercury lamp as lamp-house. It was found that the film as deposited is polymorph, with energy gap of 3.02 eV, and can absorb visible light. The film was repeatedly used for six times in degradation of 5 ppm methyl orange, and the degradation rates of methyl orange solution are 36.566%, 33.112%, 32.824%, 32.248%, 30.521% and 28.794%, respectively. After ultrasonic treatment in de-ionized water for ten minutes, the degradation rate of methyl orange solution resumes to 33.975%.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Vacuum - Volume 83, Issue 9, 22 May 2009, Pages 1147–1151
نویسندگان
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