کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1691117 | 1011296 | 2010 | 7 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Effects of oxygen flow rate on microstructure and optical properties of aluminum oxide films deposited by electron beam evaporation technique
دانلود مقاله + سفارش ترجمه
دانلود مقاله ISI انگلیسی
رایگان برای ایرانیان
کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
سطوح، پوششها و فیلمها
پیش نمایش صفحه اول مقاله

چکیده انگلیسی
Reactive evaporation technique has been used to deposit thin films of alumina (Al2O3) on crystalline Si substrates at ambient temperatures in an electron beam (e-beam) evaporation system using alumina granules as evaporant material. The loss of oxygen due to dissociation of alumina has been compensated by bleeding high purity oxygen gas into the system during evaporation. A set of samples were prepared at different flow rates of oxygen and the films have been characterized by Spectroscopic Ellipsometry (SE), Atomic Force Microscopy (AFM), Grazing Incidence X-ray Reflectivity (GIXR) and X-ray Photoelectron Spectroscopy (XPS) measurements. The density and optical properties of the films showed interesting variation with oxygen flow rates.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Vacuum - Volume 85, Issue 2, 20 August 2010, Pages 214–220
Journal: Vacuum - Volume 85, Issue 2, 20 August 2010, Pages 214–220
نویسندگان
Namita Maiti, A. Biswas, R.B. Tokas, D. Bhattacharyya, S.N. Jha, U.P. Deshpande, U.D. Barve, M.S. Bhatia, A.K. Das,