کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1691263 1011305 2009 4 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Fractal growth of Fe-N thin films prepared by magnetron sputtering at elevated temperature
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد سطوح، پوشش‌ها و فیلم‌ها
پیش نمایش صفحه اول مقاله
Fractal growth of Fe-N thin films prepared by magnetron sputtering at elevated temperature
چکیده انگلیسی
Fe-N thin films were prepared by direction-current magnetron sputtering with different process parameters. The surface morphology and fractal dimension of the films have been studied using atomic force microscopy and small angle X-ray scattering techniques. The results indicate that the surfaces of thin films exhibit an obviously self-affine fractal characteristic, and the fractal dimension is greatly affected by the N2/Ar flow rate ratio. When the N2/Ar flow rate ratio is less than 1/6, the film growth follows the KPZ growth model. Contrarily, the growth mechanism of the film is agreement with the DLCA model.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Vacuum - Volume 83, Issue 6, 12 February 2009, Pages 949-952
نویسندگان
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