کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1691296 | 1011308 | 2008 | 4 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Effect of deposition geometry on structural, electrical and optical properties of ZnO:Al films by magnetron sputtering
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
سطوح، پوششها و فیلمها
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: Effect of deposition geometry on structural, electrical and optical properties of ZnO:Al films by magnetron sputtering Effect of deposition geometry on structural, electrical and optical properties of ZnO:Al films by magnetron sputtering](/preview/png/1691296.png)
چکیده انگلیسی
Al-doped ZnO films were prepared by the dc magnetron sputtering technique on Suprasil-1 substrates at a temperature of 470Â K. Plasma-emission monitoring was used to stabilize oxygen flow to the deposition chamber. The effect of substrate position during deposition on the structural, electrical and optical properties of the films was investigated. It was found that preparation of low-resistance films with high optical transmission over the visible region is possible under condition of low plasma effects on the growing film.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Vacuum - Volume 82, Issue 10, 3 June 2008, Pages 994-997
Journal: Vacuum - Volume 82, Issue 10, 3 June 2008, Pages 994-997
نویسندگان
Halina Czternastek,