Influence of deposition pressure on the structural mechanical and decorative properties of TiN thin films deposited by cathodic arc evaporation

TiN coatings can be obtained in a relatively wide range of compositions around stoichiometry. Changing the stoichiometry around the 1:1 composition broadens the spectrum of colors and can modify the mechanical properties as compared with those of stoichiometric TiN. In this work, we present the deposition of TiN coatings by using a metallic Ti cathode and varying the nitrogen partial pressure in a cathodic arc evaporation reactive process. The composition, crystalline structure, hardness and color of the different samples are characterized, and the effect of deposition pressure is discussed. The hardest coatings were deposited in the interval of deposition pressures between 5 and 20×10−3 mbar. From the reflectance spectra in the visible range, a dominant wavelength of 581–582 nm is found for all the TiN samples, very close to that of the pure gold reference spectrum (579 nm) with purity colors that increase with the deposition pressure from 0.67 to 0.84 and approaches the color purity measured for the pure gold reference (0.91).