Deposition of TiB2 onto X40 CrMoV 5-1-1 steel substrates by DC magnetron sputtering

A deposition rate of 23 nm/min was obtained for 0.85 A cathode current intensity and 70 mm substrate-magnetron distance. For positively biased substrates, all films are dense, without a columnar structure and show a (0 0 1) texture. For negatively biased substrates, there are less surface heating effects due to a much lower electron current through the substrate, and an ordered structure appears only at −150 V.