Hopping conductivity of metal-dielectric nanocomposites produced by means of magnetron sputtering with the application of oxygen and argon ions

The obtained results have been analyzed using a model of hopping conductivity in the egime developed earlier. This analysis allowed to extract dependences of activation energy ΔEτ and times τ in a hopping regime after isochronous (15 min) thermal annealings within the range from 293 K to 673 K.