کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1691760 | 1011330 | 2006 | 4 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Growth control of carbon nanotubes by plasma-enhanced chemical vapor deposition and reactive ion etching
دانلود مقاله + سفارش ترجمه
دانلود مقاله ISI انگلیسی
رایگان برای ایرانیان
کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
سطوح، پوششها و فیلمها
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: Growth control of carbon nanotubes by plasma-enhanced chemical vapor deposition and reactive ion etching Growth control of carbon nanotubes by plasma-enhanced chemical vapor deposition and reactive ion etching](/preview/png/1691760.png)
چکیده انگلیسی
A novel process for growth of carbon nanotubes using plasma processes is reported. This process consists of formation of nanotips on substrate and growth of carbon nanotubes on it. The formation of the nanotips, which were formed under an intention to control formation of catalyst nanoparticles, was carried out on substrates by reactive ion etching. After the nanotips formation, the carbon nanotubes were grown on the substrate by plasma-enhanced chemical vapor deposition. Our results showed that the introduction of the nanotips on surface gave lower density and smaller diameter growth of carbon nanotubes than those without the structure.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Vacuum - Volume 80, Issue 7, 31 May 2006, Pages 798-801
Journal: Vacuum - Volume 80, Issue 7, 31 May 2006, Pages 798-801
نویسندگان
Hideki Sato, Takamichi Sakai, Mai Matsubayashi, Koichi Hata, Hideto Miyake, Kazumasa Hiramatsu, Akinori Oshita, Yahachi Saito,