کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1691842 | 1011343 | 2007 | 6 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Diagnostic study of low-pressure Ar-O2 remote plasma generated in HCD-L 300 system: Relative density of O atom
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
سطوح، پوششها و فیلمها
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چکیده انگلیسی
The relative density of O atom of Ar-O2 remote plasma excited in a low-pressure 13.56Â MHz hollow cathode discharge system has been investigated. The measurements were carried out at a total pressure of 0.05Â mbar, radiofrequency (RF) power of 200Â W and at three different axial distances in the plasma chamber below the outlet of the discharge source. Using optical emission spectroscopy (OES), the relative density of O ground state was determined from intensity ratio of O(844.6 nm) and Ar(750.4Â nm) lines. The electron temperature and O2+ densities have been measured using double langmuir probe measurements. The kinetic study of Ar-O2 plasma, combined with both spectroscopy and langmuir probe measurements, revealed that the main production mechanism of the excited O(3pP3) is direct excitation by electron impact. A maximum of O ground state relative density and correspondingly a minimum of O2+ density are obtained for the ratio O2/Ar:60/40. The maximum O density in the remote zone is found to be 4.5 times higher than at the outlet of source.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Vacuum - Volume 82, Issue 1, 12 September 2007, Pages 66-71
Journal: Vacuum - Volume 82, Issue 1, 12 September 2007, Pages 66-71
نویسندگان
S. Saloum, M. Naddaf,