Planar sulfur-doped silicon detectors for high-speed infrared thermography

Planar extrinsic sulfur-doped silicon detectors for infrared (IR) semiconductor-discharge gap image converters intended for use in high-speed thermography of remote objects have been developed. The detectors were fabricated by high-temperature diffusion of sulfur into silicon wafers from the vapor phase. The dependence of doping efficiency on the sulfur vapor pressure in the course of diffusion was analyzed. The detector fabrication technology was optimized to meet the specific requirements for their operation in the microdischarge devices considered. The detectors were tested in a laboratory setup comprising a blackbody source of IR light, an image converter, and a pulsed CCD camera for recording the converted images. The converter equipped with the detector can provide imaging of objects heated to a temperature, Tmin ≈ 200 °C, with a temporal resolution on the order of 10−6 s and spatial resolution of about 5 lines/mm.